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1

Channeling control for large tilt angle implantation in Si 〈100〉

Robert B. Simonton, Dennis E. Kamenitsa, Andrew M. Ray, Changhae Park, Kevin M. Klein, Al F. Tasch

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1991

Language:

english

File:

PDF, 650 KB

english, 1991

2

Process control issues for ion implantation using large tilt angles

Robert B. Simonton, Dennis E. Kamenitsa, Andy M. Ray

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1991

Language:

english

File:

PDF, 648 KB

english, 1991

3

East German Feminists in the New German Democracy

Kamenitsa, Lynn

Journal:

Gerontology & Geriatrics Education

Year:

1997

Language:

english

File:

PDF, 1.82 MB

english, 1997

4

An accurate and computationally efficient semi-empirical model for arsenic implants into single-crystal (100) silicon

Shyh-Horng Yang, Steven J. Morris, David L. Lim, Al F. Tasch, Robert B. Simonton, Dennis Kamenitsa, Charles Magee, Gayle Lux

Journal:

Journal of Electronic Materials

Year:

1994

Language:

english

File:

PDF, 859 KB

english, 1994

5

Channeling control in silicon 〈111〉 substrates by target orientation

Robert Simonton, Dennis Kamenitsa

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1989

Language:

english

File:

PDF, 401 KB

english, 1989

6

Higher charge state ion beam purity in the Eaton medium current implanter

Robert Simonton, Monty King, Dennis E. Kamenitsa

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1989

Language:

english

File:

PDF, 392 KB

english, 1989

7

Boron implant profile variation across a single wafer due to electrostatic scanning

Changhae Park, Kevin M. Klein, Al F. Tasch, Robert B. Simonton, Dennis E. Kamenitsa, Steve Novak

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1991

Language:

english

File:

PDF, 467 KB

english, 1991

8

Modification of time dependence in thermal wave signal from ion implanted wafers

N.O. Pearce, Z. Bokharey, D. Kamenitsa, R. Simonton, N. Tripsas, B. Mehrotra

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1993

Language:

english

File:

PDF, 319 KB

english, 1993

9

Improved gauge capability for ion implant monitors using temperature compensation for resistivity measurements

Walter H. Johnson, Chester L. Mallory, W. Andrew Keenan, Gil Yetter, Dennis Kamenitsa

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1993

Language:

english

File:

PDF, 497 KB

english, 1993

10

Sources of variation in therma wave measurements of ion implanted wafers

Dennis E. Kamenitsa, Robert B. Simonton

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1993

Language:

english

File:

PDF, 420 KB

english, 1993

11

Beam energy purity in the Eaton NV-8200P ion implanter

Dennis E. Kamenitsa, R.D. Rathmell

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1995

Language:

english

File:

PDF, 502 KB

english, 1995

12

Using a wedge oxide to monitor low energy beam purity by means of therma-wave measurements in the Eaton NV-8200P ion implanter

Dennis E. Kamenitsa, N.O. Pearce

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1995

Language:

english

File:

PDF, 430 KB

english, 1995

13

Use of the temperature dependence of the therma-wave technique as a thermometer

Robert D. Rathmell, Dennis Kamenitsa, Steve Brubaker, Ron Reece, N.O. Pearce

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1995

Language:

english

File:

PDF, 332 KB

english, 1995

14

The effect of dose rate on ion implanted impurity profiles in silicon

S. Tian, S.-H. Yang, S. Morris, K. Parab, A.F. Tasch, D. Kamenitsa, R. Reece, B. Freer, R.B. Simonton, C. Magee

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1996

Language:

english

File:

PDF, 444 KB

english, 1996

15

Channeling effects for silicon implantation into large‐diameter gallium arsenide substrates

Simonton, R. B., Rosenblatt, D. H., Corcoran, E., Kamenitsa, D.

Journal:

Journal of Applied Physics

Year:

1992

Language:

english

File:

PDF, 1.30 MB

english, 1992

16

[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Therma-wave dose sensitivity considerations, including energy dependence

Kamenitsa, D., Lillian, P., Luckman, G., Becker, K., Colvin, N., Rendon, M., Bokharey, Z.

Year:

2000

Language:

english

File:

PDF, 474 KB

english, 2000

17

[IEEE 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 - Kyoto, Japan (22-26 June 1998)] 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) - Long term time dependent variations in thermal wave monitor wafers

Kamenitsa, D.E., McCoy, W.R., Ostrom, L., Li Zhou,

Year:

1998

Language:

english

File:

PDF, 405 KB

english, 1998

18

[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Reducing arsenic to germanium cross contamination with isotopically enriched SDS /sup 72/GeF/sub 4/

Rendon, M.J., Locke, J., Brown, B., Kamenitsa, D.

Year:

2000

Language:

english

File:

PDF, 392 KB

english, 2000

19

[IEEE 11th International Conference on Ion Implantation Technology - Austin, TX, USA (16-21 June 1996)] Proceedings of 11th International Conference on Ion Implantation Technology - A technique for determining beam parallelism on a medium current implanter using the Therma-Wave Therma-Probe

Kamenitsa, D.E., Rathmell, R.D., McCoy, W.R., Lillian, P.K., King, M.L., Simonton, R.B.

Year:

1997

Language:

english

File:

PDF, 340 KB

english, 1997

20

[IEEE 11th International Conference on Ion Implantation Technology - Austin, TX, USA (16-21 June 1996)] Proceedings of 11th International Conference on Ion Implantation Technology - Detailed analysis and computationally efficient modeling of ultra-shallow as-implanted profiles obtained by low energy B, BF/sub 2/, and As ion implantation

Parab, K.B., Morris, M.F., Yang, S.-H., Morris, S.J., Tian, S., Obradovic, B., Tasch, A.F., Kamenitsa, D., Simonton, R., Magee, C.

Year:

1997

Language:

english

File:

PDF, 380 KB

english, 1997

21

[IEEE 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 - Kyoto, Japan (22-26 June 1998)] 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) - Beam parallelism in the 8250 medium current implanter

Rathmell, R.D., Kamenitsa, D.E., King, M.L., Ray, A.M.

Year:

1998

Language:

english

File:

PDF, 307 KB

english, 1998

22

[IEEE 11th International Conference on Ion Implantation Technology - Austin, TX, USA (16-21 June 1996)] Proceedings of 11th International Conference on Ion Implantation Technology - Metals contamination reduction on the NV-8200P

Rathmell, R.D., Brune, A., Kamenitsa, D.E., Seiler, D.

Year:

1997

Language:

english

File:

PDF, 332 KB

english, 1997

23

[IEEE 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 - Kyoto, Japan (22-26 June 1998)] 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) - Rejection of P/sup +/ contamination in P/sup ++/ implants on the Eaton 8250

Rathmell, R.D., King, M.L., Kamenitsa, D.E., Rathmell, M.A.

Year:

1998

Language:

english

File:

PDF, 292 KB

english, 1998

24

The Process of Political Marginalization: East German Social Movements after the Wall

Kamenitsa, Lynn

Journal:

Comparative Politics

Year:

1998

Language:

english

File:

PDF, 2.58 MB

english, 1998

25

How Friends Can Make the Party

Review by: Lynn Kamenitsa

Journal:

Contemporary Sociology: A Journal of Reviews

Year:

2003

Language:

english

File:

PDF, 181 KB

english, 2003

26

Monte Carlo simulation of heavy species (Indium and Germanium) ion implantation into silicon

Chen, Y., Obradovic, B., Morris, M., Wang, G., Balamurugan, G., Li, D., Tasch, A. F., Kamenitsa, D., McCoy, W., Baumann, S., Bleier, R., Sieloff, D., Dyer, D., Zeitzoff, P.

Journal:

Journal of Technology Computer Aided Design TCAD

Year:

1996

Language:

english

File:

PDF, 6.60 MB

english, 1996

27

[IEEE 11th International Conference on Ion Implantation Technology - Austin, TX, USA (16-21 June 1996)] Proceedings of 11th International Conference on Ion Implantation Technology - An accurate and computationally efficient model for phosphorus implants into (100) single-crystal silicon

Morris, S., Ghante, V., Lam, L.M., Yang, S.-H., Morris, M., Tasch, A.F., Kamenitsa, D., Sheng, J., Magee, C.

Year:

1997

Language:

english

File:

PDF, 337 KB

english, 1997

28

[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Reducing arsenic to germanium cross contamination with isotopically enriched SDS /sup 72/GeF/sub 4/

Rendon, M.J., Locke, J., Brown, B., Kamenitsa, D.

Year:

2000

Language:

english

File:

PDF, 392 KB

english, 2000

29

Post-Communist Obstacles to Mobilizing Women in Eastern Germany

Kamenitsa, Lynn

Journal:

Problems of Post-Communism

Year:

1998

Language:

english

File:

PDF, 1.78 MB

english, 1998

30

Detailed Analysis and Computationally Efficient Modeling of Ultra-Shallow Dopant Profiles Obtained by Low Energy B, Bf2, and as Ion Implantation

Parab, K. B., Yang, S.-H., Morris, S. J., Tian, S., Morris, M., Obradovich, B., Tasch, A. F., Kamenitsa, D., Simonton, R., Magee, C.

Journal:

MRS Proceedings

Year:

1995

Language:

english

File:

PDF, 374 KB

english, 1995

31

The Detailed Dependence of Implanted Phosphorus Profiles in (100) Single-Crystal Si on Key Implant Parameters

Ghante, V., Lam, L. M., Morris, S., Yang, S.-H., Tasch, A. F., Kamenitsa, D., Sheng, J., Evans, C., Magee, C.

Journal:

MRS Proceedings

Year:

1995

Language:

english

File:

PDF, 370 KB

english, 1995

32

AIP Conference Proceedings [AIP ION IMPLANTATION TECHNOLOGY 2012: Proceedings of the 19th International Conference on Ion Implantation Technology - Valladolid, Spain (25–29 June 2012)] - Angle performance on optima MDxt

David, Jonathan, Kamenitsa, Dennis

Year:

2012

Language:

english

File:

PDF, 1.09 MB

english, 2012

33

AIP Conference Proceedings [AIP ION IMPLANTATION TECHNOLOGY 2012: Proceedings of the 19th International Conference on Ion Implantation Technology - Valladolid, Spain (25–29 June 2012)] - Optima MDxt: A high throughput 335 keV mid-dose implanter

Eisner, Edward, David, Jonathan, Justesen, Perry, Kamenitsa, Dennis, McIntyre, Edward, Rathmell, Robert, Ray, Andrew, Rzeszut, Richard

Year:

2012

Language:

english

File:

PDF, 539 KB

english, 2012

34

[AIP ION IMPLANTATION TECHNOLOGY: 16th International Conference on Ion Implantation Technology - IIT 2006 - Marseille (France) (11-16 June 2006)] AIP Conference Proceedings - Implant Angle Control on Optima MD

Rathmell, R. D., Vanderberg, B., Ray, A. M., Kamenitsa, D. E., Harris, M., Wu, K.

Year:

2006

Language:

english

File:

PDF, 577 KB

english, 2006

35

Ion Implantation Technology–92 || Sources of variation in Therma Wave measurements of ion implanted wafers

Kamenitsa, Dennis E.

Year:

1993

Language:

english

File:

PDF, 1.05 MB

english, 1993

36

[AIP The fifteenth international conference on the application of accelerators in research and industry - Denton, Texas (USA) (4-7 Nov 1998)] AIP Conference Proceedings - Correlation of experimental damage data for the development of the UT-MARLOWE Monte Carlo ion implant simulator

Morris, M. F., Tian, S., Chen, Y., Tasch, A., Baumann, S., Kirchhoff, J. F., Hummel, R., Prussin, S., Kamenitsa, D., Jackson, J.

Year:

1999

File:

PDF, 784 KB

1999

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